发明名称 半導体装置
摘要 <p>Disclosed is a highly reliable semiconductor device and a manufacturing method thereof, which is achieved by using a transistor with favorable electrical characteristics and high reliability as a switching element. The semiconductor device includes a driver circuit portion and a pixel portion over one substrate, and the pixel portion comprises a light-transmitting bottom-gate transistor. The light-transmitting bottom-gate transistor comprises: a transparent gate electrode layer; an oxide semiconductor layer over the gate electrode layer, a superficial layer of the oxide semiconductor layer including comprising a microcrystal group of nanocrystals; and source and drain electrode layers formed over the oxide semiconductor layer, the source and drain electrode layers comprising a light-transmitting oxide conductive layer.</p>
申请公布号 JP5701003(B2) 申请公布日期 2015.04.15
申请号 JP20100228327 申请日期 2010.10.08
申请人 发明人
分类号 H01L29/786;G02F1/1368;H01L21/28;H01L21/336;H01L21/8234;H01L27/06;H01L29/417;H01L29/423;H01L29/49;H01L51/50;H05B33/10 主分类号 H01L29/786
代理机构 代理人
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