Procédé pour effectuer des réactions redox à la surface d'un semi-conducteur en vue d'y emmagasiner des données telles que des images,申请号FR19640994374-传众专利搜索

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发明名称	Procédé pour effectuer des réactions redox à la surface d'un semi-conducteur en vue d'y emmagasiner des données telles que des images
摘要
申请公布号	FR1458083(A)	申请公布日期	1966.03.04
申请号	FR19640994374	申请日期	1964.11.09
申请人	ITEK CORPORATION	发明人
分类号	G03C1/705;H01L21/00	主分类号	G03C1/705
代理机构		代理人
主权项
地址

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