| 摘要 |
<p>Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus (1) includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode (6) for emitting electrons, and a converging coil (10) for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils (10) with respect to the cathodes (6) in the two plasma guns (3) are opposite to each other.</p> |
