发明名称 Non-volatile semiconductor storage device
摘要 According to one embodiment, there is provided a non-volatile semiconductor storage device including a memory cell and a control unit. The memory cell has a gate electrode including a control gate and a charge storage region on a semiconductor substrate and has a channel region under the gate electrode in the semiconductor substrate. The control unit, during an erase operation where electric charges written in the charge storage region are extracted to the channel region, periodically varies a voltage which is to be applied between the control gate and the channel region.
申请公布号 US9007846(B2) 申请公布日期 2015.04.14
申请号 US201313758119 申请日期 2013.02.04
申请人 Kabushiki Kaisha Toshiba 发明人 Kaneko Akio;Sakamoto Wataru
分类号 G11C16/04;G11C16/16;G11C16/06;G11C16/14 主分类号 G11C16/04
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A non-volatile semiconductor storage device comprising: a memory cell which has a gate electrode including a control gate and a charge storage region above a semiconductor substrate and which has a channel region under the gate electrode in the semiconductor substrate; and a control unit which, during an erase operation where electric charges written in the charge storage region are extracted to the channel region, periodically varies a voltage to be applied between the control gate and the channel region, the control unit periodically varying the to-be-applied voltage between a first level where electric charges are not extracted from a cell in an erased state to the channel region and a second level where electric charges are extracted from a written cell to the channel region.
地址 Tokyo JP