发明名称 THIN FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a thin film deposition system capable of suppressing degradation of film quality of a thin film and stably forming the thin film to a longer direction of a belt base material.SOLUTION: Electrode units are arranged facing each other on a surface of a transported belt base material, and the thin film is formed on the belt base material by plasma treatment of material gas provided between a surface of the belt material and the electrode units. The electrode unit includes: an electrode part for forming plasma atmosphere; and an ion trap part. The ion trap part includes: a trap belt which runs between the electrode part and the belt base material; and an upper roll and a lower roll for supporting the trap belt so as to make the trap belt face the electrode part and the belt base material. When arrangement positions of the upper roll and the lower roll are different in a vertical direction, a running direction of the trap belt is set from an upper side to lower side in the vertical direction.
申请公布号 JP2015067851(A) 申请公布日期 2015.04.13
申请号 JP20130201922 申请日期 2013.09.27
申请人 TORAY ENG CO LTD 发明人 FUJIMOTO TAKAYOSHI;YAMASHITA MASAMITSU
分类号 C23C16/50;C23C16/44;C23C16/54;H01L21/31;H05H1/24;H05H1/46 主分类号 C23C16/50
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