发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is charged with a large amount of metal oxide, enables formation of a via hole with high resolution by using an alkali developer, and leaves no sediment in a developing apparatus.SOLUTION: The photosensitive resin composition comprises the following components with respect to 100 parts by mass of the whole solid content of the composition: (A) 40 parts by mass to 80 parts by mass of inorganic particles having a primary particle diameter of 0.04 μm to 1.00 μm; (B) 5 parts by mass to 60 parts by mass of a compound including a photopolymerizable unsaturated bond group, a carboxyl group, and/or an acid anhydride group; and (C) 0.01 parts by mass to 10.0 parts by mass of a photopolymerization initiator.
申请公布号 JP2015068930(A) 申请公布日期 2015.04.13
申请号 JP20130201750 申请日期 2013.09.27
申请人 ASAHI KASEI E-MATERIALS CORP 发明人 SASAKI YUKA
分类号 G03F7/075;G03F7/004;H01L21/027 主分类号 G03F7/075
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