METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a transparent conductive film, capable of forming a transparent conductive layer having a low resistance at a higher speed.SOLUTION: The method for manufacturing a transparent conductive film comprises the step of forming the transparent conductive layer by a sputtering method from a target including an indium-tin composite oxide on a base film. The sputtering method is a DC dual target sputtering method performed by connecting the two targets provided for each sputtering chamber in a sputtering film deposition system with DC power supplies, respectively.