SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To excellently clean the substrate surface while reducing damages to a pattern in a substrate cleaning technique for cleaning the substrate surface having a pattern formed thereon by utilizing the energy of an ultrasonic wave.SOLUTION: A substrate cleaning device comprises: a substrate holding portion which holds a substrate having a pattern formed on a surface; a cleaning liquid nozzle which supplies cleaning liquid onto the surface of the substrate and covers the pattern with cleaning liquid; and an ultrasonic wave nozzle which vibrates the substrate by supplying an ultrasonic wave applied liquid obtained by applying an ultrasonic wave to a peripheral region of the substrate located in a position closer to the end edge side than the pattern covered with the cleaning liquid. The flowing direction of liquid in the peripheral region of the substrate is dominant in the direction from the center of the substrate toward the end edge side.