发明名称 PHOTOSENSITIVE CONDUCTIVE FILM, CONDUCTIVE PATTERN FORMATION METHOD USING SAME, AND CONDUCTIVE PATTERN SUBSTRATE
摘要 This conductive pattern formation method comprises the following: a step in which prepared is a photosensitive conductive film having, in this order, a conductive layer containing conductive fibers, a photosensitive resin layer containing a photosensitive resin and an inorganic filler, and a support film, and the conductive layer and the photosensitive resin layer are laminated on the substrate from the conductive layer side so as to be tightly adhered thereto ; and a step in which a conductive pattern is formed by exposing and developing the photosensitive resin layer and the conductive layer which are on the substrate.
申请公布号 WO2015049939(A1) 申请公布日期 2015.04.09
申请号 WO2014JP72631 申请日期 2014.08.28
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 EBIHARA MASAHIKO;OOTA EMIKO;MURAKAMI YASUHARU;YAMAZAKI HIROSHI;TANAKA HIROYUKI
分类号 H01B13/00;B32B27/12;B32B27/16;B32B27/18;H01B5/14 主分类号 H01B13/00
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