发明名称 |
PHOTOSENSITIVE CONDUCTIVE FILM, CONDUCTIVE PATTERN FORMATION METHOD USING SAME, AND CONDUCTIVE PATTERN SUBSTRATE |
摘要 |
This conductive pattern formation method comprises the following: a step in which prepared is a photosensitive conductive film having, in this order, a conductive layer containing conductive fibers, a photosensitive resin layer containing a photosensitive resin and an inorganic filler, and a support film, and the conductive layer and the photosensitive resin layer are laminated on the substrate from the conductive layer side so as to be tightly adhered thereto ; and a step in which a conductive pattern is formed by exposing and developing the photosensitive resin layer and the conductive layer which are on the substrate. |
申请公布号 |
WO2015049939(A1) |
申请公布日期 |
2015.04.09 |
申请号 |
WO2014JP72631 |
申请日期 |
2014.08.28 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
EBIHARA MASAHIKO;OOTA EMIKO;MURAKAMI YASUHARU;YAMAZAKI HIROSHI;TANAKA HIROYUKI |
分类号 |
H01B13/00;B32B27/12;B32B27/16;B32B27/18;H01B5/14 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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