发明名称 METHOD FOR FABRICATING MICROSTRUCTURE TO GENERATE SURFACE PLASMON WAVES
摘要 A method for fabricating a microstructure to generate surface plasmon waves comprises steps of: preparing a substrate, and using a carrier material to carry a plurality of metallic nanoparticles and letting the metallic nanoparticles undertake self-assembly to form a microstructure on the substrate, wherein the metallic nanoparticles are separated from each other or partially agglomerated to allow the microstructure to be formed with a discontinuous surface. The present invention fabricates the microstructure having the discontinuous surface by a self-assembly method to generate the surface plasmon waves, thus exempts from using the expensive chemical vapor deposition (CVD) technology and is able to reduce the time and cost of fabrication. The present invention also breaks the structural limitation on generation of surface plasmon waves to enhance the effect of generating the surface plasmon waves.
申请公布号 US2015099321(A1) 申请公布日期 2015.04.09
申请号 US201414244460 申请日期 2014.04.03
申请人 Tsung Cheng-Sheng 发明人 Tsung Cheng-Sheng;Chuang Shih-Hao
分类号 H01L33/60 主分类号 H01L33/60
代理机构 代理人
主权项 1. A method for fabricating a microstructure to generate surface plasmon waves, comprising the steps of: Step S1: preparing a substrate; and Step S2: using a carrier material to carry a plurality of metallic nanoparticles and letting the metallic nanoparticles undertake self-assembly to form a microstructure on the substrate, wherein the plurality of metallic nanoparticles are separated from each other or partially agglomerated to allow the microstructure to be formed with a discontinuous surface.
地址 US