发明名称 COATING APPARATUS
摘要 A coating apparatus includes: a slit nozzle that discharges a coating material from a discharge port in a slit shape; a moving mechanism that relatively moves the slit nozzle with respect to a substrate in a disk shape; and a control unit that controls the moving mechanism, wherein the control unit performs a first constant speed coating treatment of relatively moving the slit nozzle with respect to the substrate at a first speed, then an acceleration coating treatment of accelerating a relative moving speed of the slit nozzle with respect to the substrate to a second speed higher than the first speed, and then a second constant speed coating treatment of relatively moving the slit nozzle with respect to the substrate at the second speed.
申请公布号 US2015096492(A1) 申请公布日期 2015.04.09
申请号 US201414481998 申请日期 2014.09.10
申请人 Tokyo Electron Limited 发明人 ISHII Takayuki
分类号 B05B12/02;B05B3/18;B05B1/04 主分类号 B05B12/02
代理机构 代理人
主权项 1. A coating apparatus for applying a coating material to a substrate, comprising: a slit nozzle that has a discharge port in a slit shape and discharges the coating material from the discharge port; a moving mechanism that relatively moves the slit nozzle with respect to a substrate in a disk shape; and a control unit that controls the moving mechanism, wherein the control unit is configured to control the moving mechanism to thereby perform a first constant speed coating treatment of relatively moving the slit nozzle with respect to the substrate at a first speed, an acceleration coating treatment of accelerating, after the first constant speed coating treatment, a relative moving speed of the slit nozzle with respect to the substrate to a second speed higher than the first speed, and a second constant speed coating treatment of relatively moving, after the acceleration coating treatment, the slit nozzle with respect to the substrate at the second speed.
地址 Tokyo JP