| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate holding mechanism and a substrate processing device capable of preventing dust emission while stably holding a lift pin even in a case where the lift pin is elevated and descended to a rotary stage.SOLUTION: In a case where a substrate 100 is processed, a lift member 31 is arranged at an intermediate position separated from a lower surface of a chuck part 14 and an upper surface of a coupling member 18, and a rotary stage 10 is rotated by driving a hollow motor 40. At this time, due to a magnetic force of a magnet 19 and a magnet 29, the coupling member 18 and a base part 11 of the rotary stage 10 are energized in a mutually-attracted direction. Therefore, the coupling member 18 and the base part 11 are prevented from being separated from each other, and a coupling part configured by the chuck part 14, the spacer 17, and the coupling member 18, and the lift pin 21 coupled to the coupling part can be rotated at a stable posture.</p> |
