| 摘要 |
<p>The present invention relates to a photosensitive polymer, a conductive substrate using the same and a method for forming pattern thereof that minimizes the generation of faulty patterns due to degeneration or physical damage to photo resist when forming conductive thin layer pattern using a lift-off method. The present invention is a conductive thin layer photosensitive polymer for patterning that contains nano materials and uses photosensitive polymer that contains physical hardening agent and non-cross-linking polymer resins. The present invention comprises: a step of forming a photosensitive polymer layer by applying photosensitive polymer that contains physical hardening agent and non-cross-linking polymer resins; a step of forming a conductive thin layer that contains nano materials ob top of the photosensitive polymer layer; a step of exposing the photosensitive polymer layer to light using a mask with open parts; and a pattern forming step where the photosensitive polymer layer is developed using developer, the polymer parts that are not exposed to light and the conductive thin layer on top of the same are eliminated, and the conductive thin layer pattern is formed.</p> |
