| 摘要 |
<p>A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a measurement system with a measurement radiation system to provide a measurement beam of radiation, at least two reflectors to reflect a portion of the measurement beam between the reflectors; and a detector to detect a wavelength of at least a portion of the measurement beam transmitted through one of the reflectors.</p> |
