发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND BLOCK COPOLYMER
摘要 The objective of the present invention is to provide the radiation-sensitive resin composition that prevents the defects and create the satisfactory resist pattern. For such, the present invention includes (A) a block copolymer that contains at least an acidic dissociative polymer block (I) and an alkali dissociative polymer block (II), and has the same polymer block (I) or the same polymer block (II) or their block copolymer containing water repellency at both sides thereof; and (B) an acidic radiation-sensitive component.
申请公布号 KR20150037565(A) 申请公布日期 2015.04.08
申请号 KR20140128015 申请日期 2014.09.25
申请人 제이에스알 가부시끼가이샤 发明人 오오사키, 히토시
分类号 G03F7/039;G03F7/38 主分类号 G03F7/039
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