| 摘要 |
<p>The present invention comprises: a step of maintaining vacuum pressure of a transfer chamber that is connected to a process chamber by a cassette chamber, closing a first control valve that is installed between the process chamber and the cassette chamber and opening a second control valve that is installed between the transfer chamber and the cassette chamber to process the substrate that is stored in the process chamber; a step of determining if a vent initiation signal is entered from the process chamber; a step of determining if the first control valve is open and the second control valve is closed upon the input of the vent initiation signal from the process chamber; a step of injecting vent gas into the process chamber if it is determined that the first control valve is open and the second control valve is closed, a step of closing the first control valve and opening the second control valve if vacuum pressure is provided to the process chamber, cassette chamber, and transfer chamber; a step of determining, upon the opening of the second control valve, if the number of processes of the process chamber has exceeded a predefined value; a step of cleaning the process chamber by providing cleaning gas to the process chamber in the event that the number of processes has exceeded the predefined value; a step of closing the first control valve and opening the second control valve during the cleaning of the process chamber; a step of emitting the cleaning gas by opening the first control valve and closing the second control valve upon the completion of the cleaning.</p> |
