| 摘要 |
In the present invention, provided are acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety, wherein the acid generators are particularly useful as a photoresist composition component. In the present invention, required are development of materials that can provided highly resolved fine features, including low linewidth roughness (LWR), and sufficient sensitivity to afford wafer throughput. |
