PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, SEMICONDUCTOR DEVICE AND METHOD FOR FORMING RESIST PATTERN

摘要

A photosensitive resin composition which contains: a resin having a phenolic hydroxyl group (component (A)); a compound having a methylol group or an alkoxyalkyl group (component (B)); an aliphatic compound having two or more functional groups which are selected from among an acryloyloxy group, a methacryloyloxy group, a glycidyloxy group and a hydroxyl group (component (C)); and a photosensitive acid generator (component (D)).