发明名称 A metal patterning structure of FTO/PolyImide film and a metal patterning method for FTO/PolyImide film
摘要 <p>The present invention relates to a metal wiring structure formed on a FTO/polyimide film coated with a FTO transparent conductive film on a polyimide flexible substrate. The metal patterning structure on a FTO/polyimide film comprises: a concave part in a line form which is formed on the FTO/polyimide film; a plurality of grooves formed in a certain pattern and at certain interval on the concave part, and recessed by a certain depth on the polyimide flexible substrate; and metal filled in the concave part and the grooves. Accordingly, the metal forms wirings and the part filled in the grooves is a pin-shaped structure. In addition, provided is a metal wiring method on a FTO/polyimide film which comprises the steps of: (a) preparing a FTO/polyimide film coated with a FTO transparent film on a polyimide flexible substrate; (b) forming a line-shaped concave part as the FTO transparent film is carved as much as a required portion through laser scribing; (c) forming a plurality of grooves recessed by a certain depth on the polyimide flexible substrate by irradiating laser to the concave part in a certain pattern and at certain intervals; and (d) filling metal in the concave part and the grooves.</p>
申请公布号 KR20150033781(A) 申请公布日期 2015.04.02
申请号 KR20130112686 申请日期 2013.09.23
申请人 发明人
分类号 H01B5/14;H01B13/00 主分类号 H01B5/14
代理机构 代理人
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