| 摘要 |
The invention relates to a method and device for gas scrubbing, in which, in a first scrubbing step (S1), substances of a first kind and, in a subsequent second scrubbing step (S2), substances of a second kind are selectively washed out from the gas mixture (1) that is made to flow in countercurrent to physically acting scrubbing agents (2, 5), wherein part (2) of the scrubbing agent (3) that is free from substances of the first kind but laden with substances of the second kind in the second scrubbing step (S2) is used in the first scrubbing step (S1), and so there occurs a scrubbing agent stream (7) that is laden with substances of the first and second kinds, during the regeneration of which a partly regenerated scrubbing agent stream (semilean) (17) that contains substances of the first and second kinds but has a lower content of substances of the first kind than the scrubbing agent stream (7) laden in the first scrubbing step is generated. The invention is distinguished by the fact that at least part (22) of the semilean stream (17) is returned directly to the first scrubbing step (S1) and used there as a scrubbing agent. |
