INDUSTRIAL FACILITY FOR CHEMICAL VAPOUR INFILTRATION OF POROUS SUBSTRATES WITH AN ACCELERATED COOLING CIRCUIT

摘要

An industrial facility (500) for chemical vapour infiltration of porous substrates comprising a sealed reaction chamber (110), a supply circuit (400), a discharge circuit (200) connected to the reaction chamber (110) and a heat exchanger (210). The facility further comprises: - an accelerated cooling circuit (300) comprising at least one inlet (301a) in selective communication with the outlet of the heat exchanger (210), and an outlet (301b) in selective communication with the supply circuit (400), - first connection means (2110; 2030) for connecting the discharge circuit (200) to the inlet of the heat exchanger (210), - second connection means (3010) for directly or indirectly connecting the inlet (301a) of the accelerated cooling circuit (300) to the outlet of the heat exchanger (210) when the reaction chamber (110) is supplied with said at least one cooling gas.