| 发明名称 |
COMPOSITE POLISHING PAD AND METHOD FOR MAKING THE SAME |
| 摘要 |
The present invention relates to a composite polishing pad and a method for making the same. The composite polishing pad includes a cushion layer and a polishing layer. The cushion layer includes a first polymeric elastomer with a hardness of 10 to 70 shore D, and is attached to the polishing layer directly. The polishing layer includes a second polymeric elastomer with a hardness of 30 to 90 shore D, and has a polishing surface for polishing a workpiece. Whereby, the polishing layer will not peel off from the cushion layer easily, so that the polishing quality is raised. |
| 申请公布号 |
US2015093979(A1) |
申请公布日期 |
2015.04.02 |
| 申请号 |
US201414500227 |
申请日期 |
2014.09.29 |
| 申请人 |
San Fang Chemical Industry Co., Ltd. |
发明人 |
FENG CHUNG-CHIH;YAO I-PENG;WU WEN-CHIEH;HUNG YUNG-CHANG |
| 分类号 |
B24B37/22;B24D3/28 |
主分类号 |
B24B37/22 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composite polishing pad, comprising:
a cushion layer, comprising a first polymeric elastomer with a hardness of 10 to 70 Shore D; and a polishing layer, attached to the cushion layer directly, comprising a second polymeric elastomer with a hardness of 30 to 90 Shore D, and having a polishing surface for polishing a workpiece. |
| 地址 |
Kaohsiung City TW |
