| 摘要 |
The present invention provides a polishing composition having excellent storage stability. The present invention is a polishing composition comprising abrasive grains and an oxidizing agent containing a halogen atom, wherein a value (A/B) determined by dividing the sum total (A) (unit: groups) of silanol groups contained in the abrasive grains in the polishing composition by the concentration (B) (unit: % by mass) of the oxidizing agent in the polishing composition is 8 × 1023 or less. |
