发明名称 ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR
摘要 <p>A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.</p>
申请公布号 WO2015047722(A1) 申请公布日期 2015.04.02
申请号 WO2014US54767 申请日期 2014.09.09
申请人 APPLIED MATERIALS, INC. 发明人 KOBAYASHI, SATORU;FLOYD, KIRBY H.;HANAWA, HIROJI;PARK, SOONAM;LUBOMIRSKY, DMITRY;KENNEY, JASON A.
分类号 H01L21/683 主分类号 H01L21/683
代理机构 代理人
主权项
地址
您可能感兴趣的专利