发明名称 感光性樹脂組成物、感光性フィルム、リブパターンの形成方法、中空構造の形成方法及び電子部品
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having excellent moist-heat resistance and having, in a cured product of the composition, a high elastic modulus at high temperature and excellent hollow structure retaining property, and to provide a photosensitive film, a method for forming a rib pattern, a method for forming a hollow structure and electronic components using the composition.SOLUTION: The photosensitive resin composition to be used as a rib material or a cap material for forming a hollow structure in an electronic component having the hollow structure comprises (A) a photopolymerizable compound having at least one ethylenically unsaturated group and (B) a photopolymerization initiator. The photosensitive film is obtained from the photosensitive resin composition. In order to significantly improve reliability of an electronic component having a hollow structure, an acrylate compound or a methacrylate compound, specifically an acrylate compound or a methacrylate compound containing an amide group is used as the (A) component.
申请公布号 JP5691920(B2) 申请公布日期 2015.04.01
申请号 JP20110167045 申请日期 2011.07.29
申请人 日立化成株式会社 发明人 加藤 禎明;亀井 淳一
分类号 G03F7/027;G03F7/004;G03F7/031;H03H3/08;H03H9/25 主分类号 G03F7/027
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