Substrate processing method and system

摘要

A substrate processing method includes a first step of subjecting a target substrate to a gas process within an atmosphere containing a fluorine-containing process gas, thereby forming a fluorine-containing reaction product on a surface of the target substrate. The method further includes a second step of subjecting the target substrate treated by the gas process to a heating process and a gas process within an atmosphere containing a reactive gas that reacts with fluorine.

主权项

1. A substrate processing system comprising:
a first gas supply section configured to supply a fluorine-containing gas to a process object; a second gas supply section configured to supply a reactive gas that reacts with fluorine to the process object; and a control section configured to control operation of the system, wherein the control section includes a computer readable non-transitory storage medium that stores a control program for execution on a computer, the control program, when executed, causing the control section to control the system to conduct a process sequence for processing a target substrate as the process object, the process sequence including: performing a first gas process of processing the target substrate within an atmosphere containing the fluorine-containing gas supplied from the first gas supply section to form a reaction product containing fluorine on a surface of the target substrate; performing a heating process to evaporate the reaction product containing fluorine from the surface of the target substrate; and performing a second gas process of processing the target substrate within an atmosphere containing the reactive gas supplied from the second gas supply section to prevent residues of the reaction product containing fluorine from being generated or to remove the residues if they are generated.