Shielded gate trench MOS with improved source pickup layout

摘要

A method for fabricating a semiconductor device includes forming a plurality of trenches using a first mask. The trenches include source pickup trenches located in outside a termination area and between two adjacent active areas. First and second conductive regions separated by an intermediate dielectric region are formed using a second mask. A first electrical contact to the first conductive region and a second electrical contact to the second conductive region are formed using a third mask and forming a source metal region. Contacts to a gate metal region are formed using a fourth mask. A semiconductor device includes a source pickup contact located outside a termination region and outside an active region of the device.

主权项

1. A semiconductor device comprising:
a semiconductor layer; a plurality of trenches formed in the semiconductor layer, the plurality of trenches include active gate trenches located in an active area, gate runner/termination trenches and source pickup trenches located in a termination area outside the active area wherein a first conductive region is located at a bottom portion of the active gate, gate runner/termination and source pickup trenches and a second conductive region is located at a top portion of the active gate and gate runner/termination trenches, and wherein the first and second conductive regions are separated by an intermediate dielectric region; a first electrical contact connected to the second conductive regions; a second electrical contact connected to the first conductive region of the source pickup trenches located in the termination area, wherein the top of the first conductive region is etched back deeply throughout the device and the second electrical contact is a deep contact to the first conductive region; and a source metal region connected to the second electrical contact and a gate metal region connected to the first electrical contact.