发明名称 THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To suppress increase in area of a contact hole and reduce a process load in a thin film transistor array substrate of a structure having a flatness film, and obtain stable contact resistance.SOLUTION: A pixel electrode 8 of an array substrate 110 is connected to a drain electrode 6 of a Thin Film Transistor (TFT) 10 via: a first aperture H1 that is formed in a second inter-layer insulation film 12; a second aperture H7 that contains a bottom part of the first aperture H1, and is formed in a common electrode 7; a third aperture H8 that contains at least a part of the bottom part of the first aperture H1, is contained in the second aperture H7, and is formed in a third inter-layer insulation film 13; and a fourth aperture H4 that is formed in a first inter-layer insulation film 11 in an area where the third aperture H8 and the bottom part of the first aperture H1 are overlapped.
申请公布号 JP2015060029(A) 申请公布日期 2015.03.30
申请号 JP20130192769 申请日期 2013.09.18
申请人 MITSUBISHI ELECTRIC CORP 发明人 HAYASHI MASAMI;HASHIGUCHI TAKASHI
分类号 G02F1/1343;G02F1/1368;G09F9/30;H01L21/768;H01L29/786 主分类号 G02F1/1343
代理机构 代理人
主权项
地址