| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide method for manufacturing a mold for nanoimprint, by which a fine rugged structure can be easily formed without applying a method requiring expensive and special equipment such as a photolithography process or an electron beam lithography, and a mold for nanoimprint.SOLUTION: A mold 13 for nanoimprint is obtained by forming an inorganic layer 11 having a plurality of protrusions 12 formed as randomly arranged on a surface of a mold substrate 10 that satisfies conditions with regard to required mechanical strength, surface roughness, or the like.</p> |
