<p>A system for treating an object with plasma includes a vacuum processing chamber having a holder on which the object to be treated is placed, at least two subassemblies each including at least one plasma source able to generate a plasma and being supplied with radio-frequency power Pi and with a gas i of independent flow rate ni. The plasma generated by one of the subassemblies is a partially ionized gas or gas mixture of different chemical nature from the plasma generated by the other subassembly or subassemblies. A process for selectively treating a composite object employing such a device is described.</p>
申请公布号
SG11201500389U(A)
申请公布日期
2015.03.30
申请号
SG11201500389U
申请日期
2013.07.22
申请人
NANOPLAS
发明人
BAUJON, GILLES;GUIDOTTI, EMMANUEL;PILLOUX, YANNICK;RABINZOHN, PATRICK;RICHARD, JULIEN;SEGERS, MARC;GIRAULT, VINCENT