MASK, MANUFACTURING METHOD OF THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a mask and a manufacturing method of the same for suppressing increase of manufacturing processes, etc.

SOLUTION: The mask comprises a first area 10 including a first peripheral part at which a halftone film 102 or a laminated film of the halftone film 102 and a light shield film 103 is formed on a translucent substrate 101 and a first opening part surrounded by the first peripheral part; and a second area 20 including a second peripheral part at which the halftone film 102 is formed on the translucent substrate 101 and a second opening part surrounded by the second peripheral part, and is configured to form a translucent film 106 on at least a portion of the second opening part and generate a prescribed phase difference between an exposure light passing through an area corresponding to a portion at which a translucent film of the second opening part and an exposure light passing through the second peripheral part.

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