发明名称 |
SYSTEM, METHOD AND APPARATUS FOR GENERATING PRESSURE PULSES IN SMALL VOLUME CONFINED PROCESS REACTOR |
摘要 |
A plasma processing system and method includes a processing chamber, and a plasma processing volume included therein. The plasma processing volume having a volume less than the processing chamber. The plasma processing volume being defined by a top electrode, a substrate support surface opposing the surface of the top electrode and a plasma confinement structure including at least one outlet port. A conductance control structure is movably disposed proximate to the at least one outlet port and capable of restricting an outlet flow through the at least one outlet port to a first flow rate and capable of increasing the outlet flow through the at least one outlet port to a second flow rate, wherein the conductance control structure restricts the outlet flow rate moves between the first flow rate and the second flow rate corresponding to a selected processing state set by the controller during a plasma process. |
申请公布号 |
SG10201404987X(A) |
申请公布日期 |
2015.03.30 |
申请号 |
SGX10201404987 |
申请日期 |
2014.08.18 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
DHINDSA, RAJINDER;SINGH, HARMEET;NAM, SANG KI |
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