| 发明名称 |
NEGATIVE-WORKING THICK FILM PHOTORESIST |
| 摘要 |
<p>Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.</p> |
| 申请公布号 |
KR20150032671(A) |
申请公布日期 |
2015.03.27 |
| 申请号 |
KR20147035916 |
申请日期 |
2013.05.13 |
| 申请人 |
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. |
发明人 |
CHEN CHUNWEI;LU PINGHUNG;LIU WEIHONG;TOUKHY MEDHAT A.;KIM, SANG CHUL;LAI SOOKMEE |
| 分类号 |
G03F7/027;G03F7/033;G03F7/038 |
主分类号 |
G03F7/027 |
| 代理机构 |
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代理人 |
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| 地址 |
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