发明名称 COMPOSITION AND METHOD FOR POLISHING MOLYBDENUM
摘要 The present invention provides compositions and methods for polishing a molybdenum metal-containing surface. A polishing composition (slurry) described herein comprises an abrasive concentration of an inorganic particulate abrasive material (e.g., alumina or silica) suspended in an acidic aqueous medium containing a water soluble surface active material and an oxidizing agent. The surface active material is selected based on the zeta potential of the particulate abrasive, such that when the abrasive has a positive zeta potential, the surface active material comprises a cationic material, and when the particulate abrasive has a negative zeta potential, the surface active material comprises an anionic material, a non-ionic material, or a combination thereof.
申请公布号 KR20150032530(A) 申请公布日期 2015.03.26
申请号 KR20147034674 申请日期 2013.06.10
申请人 CABOT MICROELECTRONICS CORPORATION 发明人 SINGH PANKAJ;JONES LAMON
分类号 C09G1/02;C09K3/14;H01L21/306;H01L21/321 主分类号 C09G1/02
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