METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern having high heat resistance and high dry etching durability and showing excellent release property from a support body.SOLUTION: The method for forming a resist pattern includes: a step (1) of exposing a resist film formed by using a resist composition on a support body, and then patterning the resist film by developing to form a pre-pattern; and a step (2) of irradiating the pre-pattern with either or both of UV rays and visible rays to cure the pre-pattern. The step (2) includes an operation of irradiating the pre-pattern with light prepared by cutting off a wavelength region shorter than 300 nm from UV rays or visible rays.