REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING SAME, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

Provided is a reflective mask blank capable of inhibiting detection of false defects caused by the surface roughness of a substrate and/or film and facilitating discovery of foreign matter and critical defects such as flaws in defect inspection using a highly sensitive defect inspection device. A reflective mask blank having a multilayered film for a mask blank comprising an absorbent film and a multilayered reflective film having a high refractive index layer and a low refractive index layer layered in alternating fashion, on the principal surface of a substrate for a mask blank, the reflective mask blank being characterized in that relationship between the bearing area (%) and the bearing depth (nm) as obtained by measurement using an atomic force microscope of a 1 μm× 1 μm area on the surface of the reflective mask bearing blank is (BA70 - BA30)/(BD70 - BD 30) ≧ 60 (%/nm) and the maximum height (Rmax) ≦̸ 4.5 nm.