Method of forming self-assembly and uniform fullerene array on surface of substrate

摘要

The present invention provides a method of forming a self-assembly fullerene array on the surface of a substrate, comprising the following steps:
(1) providing a substrate;(2) pre-annealing the substrate at a temperature ranging from 200° C. to 1200° C. in a vacuum system; and(3) providing powdered fullerene nanoparticles and depositing them on the surface of the substrate by means of physical vapor deposition technology in the vacuum system, so as to form a self-assembly fullerene array on the surface of the substrate.;The present invention also provides a fullerene embedded substrate prepared therefrom, which has excellent field emission properties and can be used as a field emitter for any field emission displays.;Finally, the present invention provides a fullerene embedded substrate prepared therefrom, which can be used to substitute for semiconductor carbides as optoelectronic devices and high-temperature, high-power, or high-frequency electric devices.

主权项

1. A method of forming a self-assembly fullerene array on the surface of a substrate, comprising:
(1) providing a substrate selected from the group consisting of silicon (110) and silicon (111); (2) pre-annealing the substrate at a temperature ranging from 600° C. to 1200° C. for between 6 to 12 hours in a vacuum system and keeping the substrate at the temperature during fullerene deposition; and (3) depositing powdered fullerene nanoparticles on the substrate by a physical vapor deposition method at a temperature ranging from 200° C. to 1200° C. in the vacuum system, thereby embedding the powdered fullerene nanoparticles into the substrate and forming a self-assembly and uniform fullerene array on the substrate.