发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method of the same, which can achieve stable characteristics against a change in temperature.SOLUTION: A semiconductor device according to an embodiment includes a first semiconductor region, a second semiconductor region and a third semiconductor region. The first semiconductor region includes silicon carbide. A conductivity type of the first semiconductor region is a first conductivity type. The second semiconductor region includes silicon carbide. A conductivity type of the second semiconductor region is a second conductivity type. The second semiconductor region is provided on the first semiconductor region. The third semiconductor region includes silicon carbide. A conductivity type of the third semiconductor region is a second conductivity type. The third semiconductor region is provided between the first semiconductor region and the second semiconductor region. When viewed in a direction which links the first semiconductor region and the second semiconductor region, an area of a region where the second semiconductor region and the third semiconductor region overlap each other is smaller than an area where the first semiconductor region and the second semiconductor region overlap each other.
申请公布号 JP2015056559(A) 申请公布日期 2015.03.23
申请号 JP20130189795 申请日期 2013.09.12
申请人 TOSHIBA CORP 发明人 OTA CHIHARU;TAKAO KAZUTO;NISHIO JOJI;SHINOHE TAKASHI
分类号 H01L29/861;H01L21/329;H01L29/06;H01L29/868 主分类号 H01L29/861
代理机构 代理人
主权项
地址
您可能感兴趣的专利