发明名称 METHOD FOR EVALUATING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY, AND METHOD FOR MANUFACTURING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING EVALUATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for simply evaluating solubility in a solvent of a polymer for lithography at low temperature with high precision.SOLUTION: A method for evaluating a polymer for semiconductor lithography includes the steps (1) and (2): a step (1) of preparing test solution which contains a polymer for semiconductor lithography and a good solvent of the polymer and a poor solvent of the polymer, and has no precipitation of the polymer; and a step (2) of lowering a temperature of the test solution, measuring a temperature in which the polymer is precipitated, and evaluating solubility of the polymer at low temperature.
申请公布号 JP2015052647(A) 申请公布日期 2015.03.19
申请号 JP20130184180 申请日期 2013.09.05
申请人 MITSUBISHI RAYON CO LTD 发明人 NAKAJO MIHO;YASUDA ATSUSHI
分类号 G03F7/26;G03F7/039 主分类号 G03F7/26
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