发明名称 METHOD AND APPARATUS FOR APPLYING VISCOUS MATERIAL
摘要 An adhering amount detecting process includes: lowering the nozzle to a trial application position; performing a trial application to apply the viscous material to a trial application surface disposed on an application stage; and detecting an amount of the viscous material adhering to the nozzle. Then, whether a difference between maximum and minimum values of the amounts of the viscous material adhering to the nozzle detected by performing the adhering amount detecting process a plurality of times exceeds a threshold is determined. If the difference is determined as not exceeding the threshold, the lowered position of the nozzle with respect to the application target is set such that a gap between the nozzle at the lowered position and an application surface of an application target coincides with a gap between the nozzle at the trial application position and the trial application surface.
申请公布号 US2015079272(A1) 申请公布日期 2015.03.19
申请号 US201414464921 申请日期 2014.08.21
申请人 Panasonic Corporation 发明人 OKAMURA Hiroshi
分类号 B05B12/08;B05D1/02 主分类号 B05B12/08
代理机构 代理人
主权项 1. A method for applying a viscous material by lowering a nozzle to a lowered position and applying a viscous material ejected from an ejection port formed at a tip end of the nozzle to an application target, said method comprising: performing an adhering amount detecting process a plurality of times, the adhering amount detecting process comprising: lowering the nozzle to a trial application position;performing a trial application to apply the viscous material to a trial application surface disposed on an application stage; anddetecting an amount of the viscous material adhering to the nozzle, after the trial application is ended and the nozzle begins to elevate from the trial application position; determining whether a difference between maximum and minimum values of the amounts of the viscous material adhering to the nozzle detected the plurality of times exceeds a threshold; and setting, if it is determined that the difference does not exceed the threshold, the lowered position of the nozzle with respect to the application target such that a gap between the nozzle at the lowered position and an application surface of the application target coincides with a gap between the nozzle at the trial application position and the trial application surface.
地址 Osaka JP