| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for simply manufacturing a low refractive index film which has excellent antireflection performance and is excellent in mechanical strength by using mesoporous silica particles, in a short time.SOLUTION: The method for manufacturing the mesoporous silica porous film which is provided on the surface of the substrate and has an ultralow refractive index comprises the steps of: (a) hydrolyzing and poly-condensing alkoxysilane in an acidic aqueous solution containing two kinds of surface active agents, subsequently adding a basic catalyst into the aqueous solution, and thereby preparing a sol containing mesoporous silica nanoparticles; (b) coating the obtained sol on the substrate and drying the sol, and forming a coating film having the mesoporous silica nanoparticles; (c) irradiating the obtained coating film with oxygen plasma, and removing the two kinds of surface active agents; and (d) subjecting the coating film having been irradiated with the oxygen plasma to alkali treatment.</p> |
