发明名称 マイクロリソグラフィ投影露光装置の光学系
摘要 <p>The system has a mirror arrangement (200) including mirror elements (200a-200c) adjustable independent of each other for changing an angle distribution of light reflected by the mirror arrangement. An overlapping degree between polarization-affecting components (101-103) e.g. Lambda/2-plates, of a polarization-affecting optical arrangement (100) and the mirror arrangement is variably adjustable by displacing the components. A deflection device (300) e.g. prism, includes reflection surfaces (300a, 300b) upstream and downstream of the mirror arrangement relative to a light propagation direction. The mirror arrangement is a micro mirror array. An independent claim is also included for a method for microlithographic manufacturing of microstructured components.</p>
申请公布号 JP5686882(B2) 申请公布日期 2015.03.18
申请号 JP20130257673 申请日期 2013.12.13
申请人 发明人
分类号 H01L21/027;G02B19/00;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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地址
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