| 摘要 |
<p>PURPOSE: A substrate support member, a substrate processing apparatus having the same, and a substrate processing method are provided to minimize a substrate to be loaded in a groove as the tilted state. CONSTITUTION: A substrate support member(100) supports a substrate(W) within a chamber(10). The substrate support member comprises a susceptor(110) and a spraying member(150). The spraying member comprises a nozzle(155) spraying purge gas to a plurality of seating grooves. The nozzle is installed on a body. The plurality of seating grooves surrounds the body. A gas supply member(200) supplies process gas to the substrate. An exhaust member(300) exhausts the process gas to outside. A heater(400) is installed at the lower side of the susceptor.</p> |
