| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate drier that can reduce process gas consumed to remove a solid and energy consumption in a process where only a solvent in a liquid on a substrate is dried and thus a solid is precipitated on the substrate before the solid is removed, when the substrate whose surface is formed by an irregularity pattern is dried by removing a liquid thereon.SOLUTION: After a naphthalene solution with naphthalene dissolved in IPA is supplied on a substrate where an irregularity pattern is formed and a liquid from a previous process is attached on its surface, only IPA in the naphthalene solution is dried to precipitate a solid naphthalene on the substrate. Then, IPA is supplied on the substrate to dissolve a naphthalene film from above and obtain a desired thickness of naphthalene. Afterward, IPA is evaporated using nitrogen gas and the substrate surface is dried by sublimating naphthalene. Nitrogen gas to be consumed can be reduced when the sublimation is done after a film thickness of naphthalene is set to a desired one. |
