| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device.SOLUTION: An exposure device used for a minimal fab-production system has: a wafer stage 12 for locating a wafer w that can move to an exposing optical system 40 in x, y, and z-axis directions; a reference face 13 provided on the wafer stage at a position where the wafer is not located, and being vertical to an optical axis of the exposing optical system; auto-focus means 50 for setting the reference face at a focal position of the exposing position; and height detection means 60 for detecting a height position of the reference face and a wafer height position of the wafer located on the wafer stage. The height position of the reference face aligned with the focal position of the exposing optical system is detected by the height detection means, so as to find a focal distance d of the exposing optical system in advance. Also, the wafer height position of the wafer located on the wafer stage is detected by the height detection means, so as to move the wafer stage along a z-axis so that the wafer height position is identical to the pre-found focal distance. |
