| 摘要 |
PROBLEM TO BE SOLVED: To achieve the formation of a pattern in a state where limitation is relieved, using a vertical cylinder phase structure formed by a microphase separation.SOLUTION: In a pattern formation method, a plasma oxidized layer 102 is formed on a surface of a substrate 101; a block copolymer thin film 103 comprising a block copolymer is formed on the plasma oxidized layer 102, the block copolymer comprising a first block chain and a second block chain having surface free energies different with each other; the block copolymer thin film 103 is heated to induce a microphase separation; a plurality of columnar phase structures 104 comprising the first block chain are formed on the block copolymer thin film 103; and the block copolymer thin film 103 is immersed into a process liquid 105 comprising an ammonium fluoride aqueous solution to form a plurality of openings 106. |
