| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device.SOLUTION: An exposure device used for a minimal fab-production system includes: a center shaft 11 fixed to a pedestal 21; X-axis and Y-axis moving means 32, 33 for adjusting a position of the pedestal in X-axis and Y-axis directions respectively; an outer peripheral stage 12 that is inserted in the center shaft and can rotate to the center shaft in a &thetas;-axis direction and move in the Z-axis direction; and &thetas;-axis moving means 30 for rotating and aligning the outer peripheral stage in the &thetas;-axis direction and Z-axis moving means 31 for moving the outer peripheral stage in the Z-axis direction. The &thetas;-axis moving means is arranged at an uppermost position than the other moving means. The outer peripheral stage 12 has a first placement face 12a on which a wafer is placed, and a first vacuum suction port 12a. The center shaft 11 has a second placement face 11d on which the wafer is placed, and a second vacuum suction port 11a. When the first placement face and the second placement face are positioned on the same plane, the second vacuum suction port functions. When the first placement face is positioned above the second placement face, the first vacuum suction port functions and the &thetas;-axis moving means is controlled to be driven. |
