| 摘要 |
PROVIDED IS A CYLINDRICAL CERAMIC SPUTTERING TARGET, WHICH SIGNIFICANTLY REDUCES THE OCCURRENCE OF A CRACK, A CHIP, EXTRAORDINARY DISCHARGE AND A NODULE. BY FILLING A MOLTEN BONDING MATERIAL IN A CAVITY DEFINED BY A CYLINDRICAL CERAMIC TARGET MATERIAL AND A CYLINDRICAL BASE MATERIAL, STARTING COOLING THE MOLTEN BONDING MATERIAL FROM ITS ONE END TOWARD ITS OTHER END IN A CYLINDRICAL AXIAL DIRECTION IN SEQUENCE, AND FURTHER FILLING THE MOLTEN BONDING MATERIAL IN THE CAVITY DURING COOLING, A CYLINDRICAL CERAMIC SPUTTERING TARGET IS MANUFACTURED SO AS TO BE CHARACTERIZED IN THAT AS OBSERVED BY AN X-RAY RADIOGRAPH OF THE BONDING MATERIAL, THE TOTAL AREA OF PORTIONS WHERE NO BONDING MATERIAL EXISTS IS 10 CM2 OR LESS PER 50 CM OF X-RAY RADIOGRAPH AREA, AND THE MAXIMUM AREA OF THE PORTIONS WHERE NO BONDING MATERIAL EXISTS IS 9 CM2 OR LESS. |
