| 摘要 |
PROBLEM TO BE SOLVED: To improve productivity, and also cope with various-kind and small-lot production.SOLUTION: A film deposition device 100 comprises a first film deposition unit 21, a second film deposition unit 22, a first exhaust unit 41, and a second exhaust unit 42. The first film deposition unit 21 includes a first processing chamber 31, and a first door 11 that can seal the first processing chamber 31. The second film deposition unit 21 includes a second processing chamber 32, and a second door 12 that can seal the second processing chamber 32. The first exhaust unit 41 has a first vacuum pump P1, and constituted so that any one of the first and the second processing chambers 31, 32 can be vacuum exhausted. The second exhaust unit 42 has a second vacuum pump P2 with higher ultimate vacuum than that of the first vacuum pump P1, and is constituted so that any one of the first and second processing chambers 31, 32 can be vacuum exhausted. |
