发明名称 Backside Contacts for Integrated Circuit Devices
摘要 A chip includes a semiconductor substrate, a well region in the semiconductor substrate, and a transistor formed at a front side of the semiconductor substrate. A source/drain region of the transistor is disposed in the well region. A well pickup region is disposed in the well region, wherein the well pickup region is at a back side of the semiconductor substrate. A through-via penetrates through the semiconductor substrate, wherein the through-via electrically inter-couples the well pickup region and the source/drain region.
申请公布号 US2015069520(A1) 申请公布日期 2015.03.12
申请号 US201314021881 申请日期 2013.09.09
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Lee Jam-Wem
分类号 H01L27/092;H01L21/8238 主分类号 H01L27/092
代理机构 代理人
主权项 1. An integrated circuit structure comprising: a first chip comprising: a semiconductor substrate;a well region in the semiconductor substrate;a transistor formed at a front side of the semiconductor substrate, wherein a source/drain region of the transistor is disposed in the well region; anda well pickup region in the well region, wherein the well pickup region is at a back side of the semiconductor substrate.
地址 Hsin-Chu TW